发明申请
- 专利标题: Hologram plate and its fabrication process
- 专利标题(中): 全息图及其制作工艺
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申请号: US09765373申请日: 2001-01-22
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公开(公告)号: US20010030780A1公开(公告)日: 2001-10-18
- 发明人: Keiko Sekine , Hiroshi Kishimoto , Masaki Katsumata , Yoichi Higuchi , Nobuhiko Ichikawa , Tadatsugu Onuma
- 优先权: JP012578/2000 20000121; JP083601/2000 20000324; JP126077/2000 20000426
- 主分类号: G03H001/02
- IPC分类号: G03H001/02 ; G03H001/20 ; G02B005/32 ; G03H001/30
摘要:
The invention provides a hologram plate which is used with the double-focus replication process, and which is integrated with a spacer to impart marring resistance thereto, and is integrated with a light absorbing layer to allow zero-order light and first-order light to have substantially the same intensity. This hologram plate 42 comprises an array of collective element holograms for diffracting parallel light incident thereon at a specific wavelength and a specific incident angle in such a way that the light is converged onto a specific focal length position. The hologram plate 42 is a multilayer structure made up of a first transparent substrate 31, a hologram layer 32, an adhesive layer 33 and a second transparent substrate 41. The second transparent substrate 42 defines a surface in contact with a hologram photosensitive material 53 during hologram replication.
公开/授权文献
- US06714329B2 Hologram plate and its fabrication process 公开/授权日:2004-03-30
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