Invention Application
- Patent Title: Electron optical system array, method of fabricating the same, charged-particle beam exposure apparatus, and device manufacturing method
- Patent Title (中): 电子光学系统阵列，其制造方法，带电粒子束曝光装置和器件制造方法
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Application No.: US09819669Application Date: 2001-03-29
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Publication No.: US20010054690A1Publication Date: 2001-12-27
- Inventor: Yasuhiro Shimada , Takayuki Yagi , Haruhito Ono
- Priority: JP097067/2000 20000331; JP074736/2001 20010315
- Main IPC: G21K007/00
- IPC: G21K007/00 ; G01N023/00
Abstract:
This invention relates to an electron optical system array having a plurality of electron lenses. The electron optical system array includes a plurality of electrodes arranged along the paths of a plurality of charged-particle beams. Each of the plurality of electrodes has a membrane in which a plurality of apertures are formed on the paths of the plurality of charged-particle beams, and a support portion which supports the membrane. At least two of the plurality of electrodes are arranged to form a nested structure.
Public/Granted literature
Information query
