Invention Application
- Patent Title: Spring structure with self-aligned release material
- Patent Title (中): 具有自对准脱模材料的弹簧结构
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Application No.: US09917572Application Date: 2001-07-27
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Publication No.: US20020016095A1Publication Date: 2002-02-07
- Inventor: David K. Fork , Jackson Ho , Rachel King-Ha Lau , JengPing Lu
- Applicant: Xerox Corporation
- Applicant Address: null
- Assignee: Xerox Corporation
- Current Assignee: Xerox Corporation
- Current Assignee Address: null
- Main IPC: H05K001/00
- IPC: H05K001/00 ; H01R012/00

Abstract:
Efficient methods for lithographically fabricating spring structures onto a substrate containing contact pads or metal vias by forming both the spring metal and release material layers using a single mask. Specifically, a pad of release material is self-aligned to the spring metal finger using a photoresist mask or a plated metal pattern, or using lift-off processing techniques. A release mask is then used to release the spring metal finger while retaining a portion of the release material that secures the anchor portion of the spring metal finger to the substrate. When the release material is electrically conductive (e.g., titanium), this release material portion is positioned directly over the contact pad or metal via, and acts as a conduit to the spring metal finger in the completed spring structure. When the release material is non-conductive, a metal strap is formed to connect the spring metal finger to the contact pad/via.
Public/Granted literature
- US06658728B2 Method for fabricating a spring structure on a substrate Public/Granted day:2003-12-09
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