Invention Application
US20020034916A1 Method of manufacturing a spacer used in an electron beam generating device, an electron beam generating device using the spacer and image-forming apparatus
失效
制造用于电子束产生装置的间隔物的方法，使用间隔物的电子束产生装置和图像形成装置
- Patent Title: Method of manufacturing a spacer used in an electron beam generating device, an electron beam generating device using the spacer and image-forming apparatus
- Patent Title (中): 制造用于电子束产生装置的间隔物的方法，使用间隔物的电子束产生装置和图像形成装置
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Application No.: US09954073Application Date: 2001-09-18
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Publication No.: US20020034916A1Publication Date: 2002-03-21
- Inventor: Masahiro Fushimi , Yasushi Shioya , Yasushi Shimizu
- Priority: JP284096/2000 20000919; JP280146/2001 20010914
- Main IPC: H01J009/24
- IPC: H01J009/24
Abstract:
The present application discloses a method of manufacturing a spacer having an excellent characteristic, and more particularly a method of efficiently manufacturing the spacer. Specifically, in a method of manufacturing a spacer used in an electron beam generating device, there is provided a step of providing a material for forming a film on a film formation surface of a spacer base substance in a state where the spacer base substance is nipped, wherein the material providing step is achieved in a state where the film formation surface is not projected from an end portion of a nipping member for nipping the spacer base substance.
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