Invention Application
US20020037656A1 Interconnect structure 失效
互连结构

  • Patent Title: Interconnect structure
  • Patent Title (中): 互连结构
  • Application No.: US09955302
    Application Date: 2001-09-19
  • Publication No.: US20020037656A1
    Publication Date: 2002-03-28
  • Inventor: Yoshinori Murakami
  • Priority: JP2000-282945 20000919
  • Main IPC: H05K001/00
  • IPC: H05K001/00
Interconnect structure
Abstract:
An interconnect structure has a plurality of planar interconnects (1, 2) mutually superposed with a prescribed distance therebetween and serving as interconnects between two circuit boards (A, B), each of the planar interconnects (1, 2) having at least two connection terminals (1A, 1B, 2A, 2B) at the circuit boards (1, 2). Rather than using rigid wire interconnects as done in the past to make interconnections, planar interconnects having relatively large surface areas are used to increase the line-to-line capacitance, thereby enhancing the filtering function that reduces high-frequency noise.
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