Invention Application
- Patent Title: Interconnect structure
- Patent Title (中): 互连结构
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Application No.: US09955302Application Date: 2001-09-19
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Publication No.: US20020037656A1Publication Date: 2002-03-28
- Inventor: Yoshinori Murakami
- Priority: JP2000-282945 20000919
- Main IPC: H05K001/00
- IPC: H05K001/00

Abstract:
An interconnect structure has a plurality of planar interconnects (1, 2) mutually superposed with a prescribed distance therebetween and serving as interconnects between two circuit boards (A, B), each of the planar interconnects (1, 2) having at least two connection terminals (1A, 1B, 2A, 2B) at the circuit boards (1, 2). Rather than using rigid wire interconnects as done in the past to make interconnections, planar interconnects having relatively large surface areas are used to increase the line-to-line capacitance, thereby enhancing the filtering function that reduces high-frequency noise.
Public/Granted literature
- US06641407B2 Conductor interconnect structure connecting circuit boards Public/Granted day:2003-11-04
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