Invention Application
- Patent Title: REDUCED RESIDUE HARD SURFACE CLEANER
- Patent Title (中): 减少残留硬表面清洁剂
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Application No.: US08869854Application Date: 1997-06-05
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Publication No.: US20020045557A1Publication Date: 2002-04-18
- Inventor: ELIZABETH A. CABLE , ARAM GARABEDIAN JR.
- Main IPC: C11D017/00
- IPC: C11D017/00 ; C11D017/08

Abstract:
The invention provides an aqueous, hard surface cleaner with significantly improved residue removal and substantially reduced filming/streaking, said cleaner comprising: (a) an effective amount of at least one organic solvent with a vapor pressure of at least 0.001 mm Hg at 25null C., and mixtures of such solvents; (b) an effective amount of a mixture of anionic surfactants; (c) an effective amount of a buffering system which comprises a nitrogenous buffer which will result in a pH of greater than 6.5; and (d) the remainder as substantially all water.
Public/Granted literature
- US06399553B1 Reduced residue hard surface cleaner Public/Granted day:2002-06-04
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