Invention Application
- Patent Title: Substrate provided with antireflection films and its production method
- Patent Title (中): 基片提供防反射膜及其制作方法
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Application No.: US09912362Application Date: 2001-07-26
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Publication No.: US20020051294A1Publication Date: 2002-05-02
- Inventor: Yoshihito Katayama , Yukio Kimura , Mikako Maekawa , Eiji Shidoji , Kazuyoshi Noda
- Applicant: Asahi Glass Company, Limited
- Applicant Address: JP Chiyoda-ku
- Assignee: Asahi Glass Company, Limited
- Current Assignee: Asahi Glass Company, Limited
- Current Assignee Address: JP Chiyoda-ku
- Priority: JP2000-226960 20000727
- Main IPC: G02B001/10
- IPC: G02B001/10

Abstract:
It is to provide a substrate provided with antireflection films, which is excellent in antireflection properties to incident light at an oblique angle from the film face side, which has a high transmittance and with which the reflection color tone does not tend to be bluish. A substrate provided with antireflection films, which comprises a transparent substrate and at least two antireflection film layers deposited on one side of the transparent substrate, wherein the reflectance on the film face of light incident at an angle of incidence of 5null from the film face side is at most 6% at the entire wavelength region ranging from 400 to 480 nm.
Public/Granted literature
- US06570709B2 Substrate provided with antireflection films and its production method Public/Granted day:2003-05-27
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