发明申请
- 专利标题: Integrated dual source recycling system for chemical laser weapon systems
- 专利标题(中): 化学激光武器系统综合双源回收系统
-
申请号: US09730722申请日: 2000-12-06
-
公开(公告)号: US20020067753A1公开(公告)日: 2002-06-06
- 发明人: Alan Z. Ullman , William E. McDermott
- 主分类号: H01S003/095
- IPC分类号: H01S003/095
摘要:
An integrated dual source recycling system for a chemical oxygen-iodine laser system is described. The recycling system primarily includes: (1) a first collection system for collecting an amount of spent basic hydrogen peroxide comprised of spent aqueous potassium chloride; and (2) a second collection system for collecting an amount of the spent laser exhaust gas. Several processing systems are also employed to convert the spent aqueous potassium chloride and the spent laser exhaust gas into hydrogen peroxide and potassium hydroxide which are mixed together to form fresh basic hydrogen peroxide. Additionally, the spent laser exhaust gas is recycled back into molecular nitrogen, molecular iodine, molecular oxygen, and molecular chlorine.