Invention Application
- Patent Title: Processless lithographic printing plate
- Patent Title (中): 无处理平版印刷版
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Application No.: US10002944Application Date: 2001-11-02
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Publication No.: US20020068239A1Publication Date: 2002-06-06
- Inventor: Marc Van Damme , Wim Sap , Huub Van Aert
- Applicant: Agfa-Gevaert
- Applicant Address: BE Mortsel
- Assignee: Agfa-Gevaert
- Current Assignee: Agfa-Gevaert
- Current Assignee Address: BE Mortsel
- Priority: EP00204091.3 20001121
- Main IPC: G03F007/09
- IPC: G03F007/09

Abstract:
A negative-working heat-sensitive material for making a lithographic printing plate by direct-to-plate recording is disclosed. The material comprises in the order given a lithographic base having a hydrophilic surface, an oleophilic imaging layer and a cross-linked hydrophilic upper layer which comprises an organic compound derived from sulfonic acid, sulfuric acid, phosphoric acid or phosphonic acid. Materials according to the invention are characterized by an increased water-acceptance in the non-printing areas, which allows a rapid start-up of the press.
Public/Granted literature
- US06790595B2 Processless lithographic printing plate Public/Granted day:2004-09-14
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