Invention Application
US20020079490A1 Structure, method of manufacturing the structure, and DNA separation device using the structure
审中-公开
结构,结构的制造方法和使用该结构的DNA分离装置
- Patent Title: Structure, method of manufacturing the structure, and DNA separation device using the structure
- Patent Title (中): 结构,结构的制造方法和使用该结构的DNA分离装置
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Application No.: US09969792Application Date: 2001-10-04
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Publication No.: US20020079490A1Publication Date: 2002-06-27
- Inventor: Shinichi Izuo , Hiroshi Ohji , Kazuhiko Tsutsumi
- Applicant: Mitsubishi Denki Kabushiki Kaisha
- Applicant Address: JP Tokyo
- Assignee: Mitsubishi Denki Kabushiki Kaisha
- Current Assignee: Mitsubishi Denki Kabushiki Kaisha
- Current Assignee Address: JP Tokyo
- Priority: JP2000-385396 20000919
- Main IPC: H01L023/58
- IPC: H01L023/58

Abstract:
Providing a columnar structure having a uniform shape and excellent heat resistance and mechanical strength that is formed on a substrate of silicon, a method of preparing the structure, and a DNA separation device prepared by the method. A structure has, on a substrate made of silicon, columns of which main surface is covered with a thermally oxidized film. The columns are made of the thermally oxidized film only or of the thermally oxidized film and silicon. The thermally oxidized film formed on the columns is connected to those formed on the surface or inside of the substrate.
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