发明申请
US20020115014A1 Imageable photoresist laminate 有权
可成像光刻胶层压板

Imageable photoresist laminate
摘要:
A photosensitive laminate structure including a carrier layer and a photosensitive layer is described. The photosensitive layer includes a polymeric photosensitive resin composition containing at least one cross-linkable unit represented by the formula: 1 wherein X is an organic moity and Y is selected from the following group: 2 wherein Z is selected from at least one of lithium, sodium, potassium, ammonium, monoalkylammonium, dialkylammonium, and tetraalkylammonium.
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