Invention Application
US20020165714A1 Method of determining model-specific factors for pattern recognition, in particular for speech patterns 有权
确定模式识别特定因素的方法,特别是语音模式

  • Patent Title: Method of determining model-specific factors for pattern recognition, in particular for speech patterns
  • Patent Title (中): 确定模式识别特定因素的方法,特别是语音模式
  • Application No.: US10135336
    Application Date: 2002-04-30
  • Publication No.: US20020165714A1
    Publication Date: 2002-11-07
  • Inventor: Peter Beyerlein
  • Applicant: U.S. Philips Corporation
  • Applicant Address: null
  • Assignee: U.S. Philips Corporation
  • Current Assignee: U.S. Philips Corporation
  • Current Assignee Address: null
  • Priority: DE19755191.2 19971212; EP98203725.1 19981106
  • Main IPC: G10L015/00
  • IPC: G10L015/00
Method of determining model-specific factors for pattern recognition, in particular for speech patterns
Abstract:
A method for recognizing a pattern that comprises a set of physical stimuli, said method comprising the steps of: providing a set of training observations and through applying a plurality of association models ascertaining various measuring values pj(knullx), jnull1 . . . M, that each pertain to assigning a particular training observation to one or more associated pattern classes; setting up a log/linear association distribution by combining all association models of the plurality according to respective weight factors, and joining thereto a normalization quantity to produce a compound association distribution; optimizing said weight factors for thereby minimizing a detected error rate of the actual assigning to said compound distribution; recognizing target observations representing a target pattern with the help of said compound distribution.
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