Invention Application
- Patent Title: Micromirror unit fabrication method and micromirror unit made by the same
- Patent Title (中): 微镜单元制造方法和由其制成的微镜单元
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Application No.: US09995588Application Date: 2001-11-29
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Publication No.: US20030035192A1Publication Date: 2003-02-20
- Inventor: Yoshihiro Mizuno , Satoshi Ueda , Osamu Tsuboi , Ippei Sawaki , Hisao Okuda , Fumio Yamagishi , Norinao Kouma
- Applicant: FUJITSU LIMITED
- Applicant Address: JP Kawasaki
- Assignee: FUJITSU LIMITED
- Current Assignee: FUJITSU LIMITED
- Current Assignee Address: JP Kawasaki
- Priority: JP2001-249695 20010820
- Main IPC: G02B026/00
- IPC: G02B026/00

Abstract:
A method of making a micromirror unit is provided. In accordance with the method, a micromirror unit is made from a material substrate having a multi-layer structure composed of silicon layers and at least one intermediate layer. The resulting micromirror unit includes a mirror forming base, a frame and a torsion bar. The method includes the following steps. First, a pre-torsion bar is formed by subjecting one of the silicon layers to etching. The obtained pre-torsion bar is rendered smaller in thickness than the mirror forming base and is held in contact with the intermediate layer. Then, the desired torsion bar is obtained by removing the intermediate layer contacting with the pre-torsion bar.
Public/Granted literature
- US06723659B2 Micromirror unit fabrication method and micromirror unit made by the same Public/Granted day:2004-04-20
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