Invention Application
- Patent Title: Multilayer material and manufacturing method of the same
- Patent Title (中): 多层材料及其制造方法相同
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Application No.: US10285481Application Date: 2002-11-01
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Publication No.: US20030096136A1Publication Date: 2003-05-22
- Inventor: Masahito Fujita , Eisaku Inoue , Takayuki Shibayama
- Applicant: Daido Metal Company Ltd.
- Applicant Address: JP Nagoya
- Assignee: Daido Metal Company Ltd.
- Current Assignee: Daido Metal Company Ltd.
- Current Assignee Address: JP Nagoya
- Priority: JP2001-336574 20011101
- Main IPC: B32B015/01
- IPC: B32B015/01

Abstract:
A multilayer material comprising a backing material (10) and a obverse material (12) made of a metal different from the backing material, said obverse material being bonded to the backing material, said obverse material having a rapidly cooled dendrite structure extended substantially vertically to the backing material, said dendrite structure having a grain size not more than 0.02 mm in a cutting plane in parallel to the backing material and/or a dendrite arm spacing not more than 0.02 mm in a cutting plane vertical to the backing material.
Public/Granted literature
- US06753092B2 Multilayer material and manufacturing method of the same Public/Granted day:2004-06-22
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