发明申请
- 专利标题: Semiconductor device
- 专利标题(中): 半导体器件
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申请号: US10322492申请日: 2002-12-19
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公开(公告)号: US20030107079A1公开(公告)日: 2003-06-12
- 发明人: Hiroshi Iwata , Seizo Kakimoto , Masayuki Nakano , Kouichiro Adachi
- 申请人: Sharp Kabushiki Kaisha
- 申请人地址: null
- 专利权人: Sharp Kabushiki Kaisha
- 当前专利权人: Sharp Kabushiki Kaisha
- 当前专利权人地址: null
- 优先权: JP10-185492 19980630
- 主分类号: H01L029/76
- IPC分类号: H01L029/76 ; H01L029/94 ; H01L031/062 ; H01L031/113 ; H01L031/119
摘要:
A semiconductor device having a device separation region and an active region includes a gate oxide film, a source/drain region, and an electrode which is electrically coupled to the source/drain region. The active region is in contact with the gate oxide film at a first face, a portion of the source/drain regions being located above the first face. The electrode is in contact with the source/drain region at a second face, the second face constituting an angle with respect to the first face.
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