Invention Application
- Patent Title: NONSTICK LAYER FOR A MICROMECHANICAL COMPONENT
- Patent Title (中): 用于微机电组件的非磁性层
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Application No.: US09445374Application Date: 2000-03-02
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Publication No.: US20030139040A1Publication Date: 2003-07-24
- Inventor: MARTIN SCHOEFTHALER , PETER HEIN , HELMUT SKAPA , HORST MUENZEL
- Priority: DE19723766.5 19970606
- Main IPC: B44C001/22
- IPC: B44C001/22 ; C03C015/00 ; C03C025/68 ; H01L021/302 ; H01L021/461

Abstract:
The invention proposes a method for manufacturing micromechanical components, and a micromechanical component, in which a movable element (4) is produced on a sacrificial layer (2). In a subsequent step the sacrificial layer (2) beneath the movable element (4) is removed so that the movable element (4) becomes movable. After removal of the sacrificial layer (2), a protective layer (7) is deposited on a surface of the movable element (4). Silicon oxide and/or silicon nitride is used for the protective layer (7).
Public/Granted literature
- US06656368B2 Nonstick layer for a micromechanical component Public/Granted day:2003-12-02
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