Invention Application
US20030139040A1 NONSTICK LAYER FOR A MICROMECHANICAL COMPONENT 有权
用于微机电组件的非磁性层

NONSTICK LAYER FOR A MICROMECHANICAL COMPONENT
Abstract:
The invention proposes a method for manufacturing micromechanical components, and a micromechanical component, in which a movable element (4) is produced on a sacrificial layer (2). In a subsequent step the sacrificial layer (2) beneath the movable element (4) is removed so that the movable element (4) becomes movable. After removal of the sacrificial layer (2), a protective layer (7) is deposited on a surface of the movable element (4). Silicon oxide and/or silicon nitride is used for the protective layer (7).
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