A method for imaging patterning compositions comprising the steps of: (1) providing at least one patterning composition layer on a substrate; said patterning composition comprising: (a) at least one acid generator; (b) at least one cross linking resin or compound; (c) at least one binder resin comprising a polymer containing reactive pendant group selected from group consisting of hydroxyl, carboxylic acid, sulfonamide, active imide, alkoxymethylamides and mixtures thereof; and (d) at least one infrared absorber; (2) imagewise exposing the patterning composition layer to actinic radiation; (3) treating the imaged patterning composition layer with heat energy to treat the imaged portions of the composition layer; (4) flood exposing the heat-treated, imaged patterning composition layer with UV light for a predetermined time, said time being sufficient to promote the effective clear-out of non-imaged portions during the developing step without causing substantial deterioration of the imaged portions; and (5) developing the flood exposed, heat-treated imaged patterning composition with an aqueous alkaline developer to remove the non-imaged areas of the patterning composition layer and leaving the imaged areas substantially unaffected.