Invention Application
- Patent Title: Inductor element having a high quality factor
- Patent Title (中): 电感元件具有高品质因素
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Application No.: US10309213Application Date: 2002-12-04
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Publication No.: US20030184426A1Publication Date: 2003-10-02
- Inventor: In-sang Song
- Applicant: Samsung Electronics Co., Ltd.
- Applicant Address: null
- Assignee: Samsung Electronics Co., Ltd.
- Current Assignee: Samsung Electronics Co., Ltd.
- Current Assignee Address: null
- Priority: KR2001-76981 20011206
- Main IPC: H01F005/00
- IPC: H01F005/00

Abstract:
An inductor element having a high quality factor, wherein the inductor element includes an inductor helically formed on a semiconductor substrate and a magnetic material film on a surface of the inductor for inducing magnetic flux generated by the inductor. The magnetic material film preferably includes a first magnetic material film disposed on a lower surface of the inductor, between the substrate and the inductor, and a second magnetic material film disposed on an upper surface of the inductor. The magnetic material film may be patterned according to a direction along which the magnetic flux flows, for example, radially. Since the magnetic flux proceeding toward the upper part and lower part of the inductor is induced by the magnetic material film, the effect of the magnetic flux generated in the inductor on external circuits may be reduced and the efficiency of the inductor may be enhanced.
Public/Granted literature
- US07151429B2 Inductor element having a high quality factor Public/Granted day:2006-12-19
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