Invention Application
- Patent Title: Magnetoresistance effect film and method of forming same
- Patent Title (中): 磁阻效应膜及其形成方法
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Application No.: US10462683Application Date: 2003-06-17
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Publication No.: US20030224103A1Publication Date: 2003-12-04
- Inventor: Hiroyuki Akinaga , Masaharu Oshima , Masaki Mizuguchi
- Applicant: NAT. INST. OF ADVANCED INDUSTR. SCIENCE AND TECH. , Hiroyuki AKINAGA
- Applicant Address: JP Chiyoda-ku JP Tsukuba-shi
- Assignee: NAT. INST. OF ADVANCED INDUSTR. SCIENCE AND TECH.,Hiroyuki AKINAGA
- Current Assignee: NAT. INST. OF ADVANCED INDUSTR. SCIENCE AND TECH.,Hiroyuki AKINAGA
- Current Assignee Address: JP Chiyoda-ku JP Tsukuba-shi
- Priority: JP11-82062 19990325; JP11-204443 19990719
- Main IPC: B05D005/12
- IPC: B05D005/12

Abstract:
A magnetoresistance effect film includes a substrate, a plurality of ferromagnetic particles disposed on the substrate, a nonmagnetic film deposited on the substrate and covering the plurality of ferromagnetic particles, and a pair of electrodes arranged on the nonmagnetic film, in which the resistance across the pair of electrodes is changed by applying a magnetic field. The magnetoresistance effect film is manufactured by vapor-depositing ferromagnetic particle starting material on a substrate at a temperature not exceeding 300null C., the starting material being vapor-deposited in an amount enough to cover the substrate surface to a thickness ranging from 0.5 to 15 nm, and, after formation of ferromagnetic particles on the substrate, vapor-depositing at a temperature not exceeding room temperature a nonmagnetic film over the ferromagnetic particles, the nonmagnetic film having a thickness ranging from 1 to 100 nm, and providing a pair of electrodes each at a predetermined position on the nonmagnetic film.
Public/Granted literature
- US06808740B2 Magnetoresistance effect film and method of forming same Public/Granted day:2004-10-26
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