Invention Application
- Patent Title: FOCUS ERROR DETECTION APPARATUS AND METHOD
- Patent Title (中): 焦点错误检测装置和方法
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Application No.: US10192220Application Date: 2002-07-09
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Publication No.: US20040007659A1Publication Date: 2004-01-15
- Inventor: Haim Feldman , Boris Golberg , Alexander Libinson
- Applicant: Applied Materials Israel Ltd
- Applicant Address: null
- Assignee: Applied Materials Israel Ltd
- Current Assignee: Applied Materials Israel Ltd
- Current Assignee Address: null
- Main IPC: G02B007/04
- IPC: G02B007/04 ; G02B027/40

Abstract:
An apparatus and method for focus error detection operable to receive light reflected from an inspected object and to determine a focus error on a surface of the inspected object, the focus error detection apparatus including optics and at least one detection apparatus, whereas the optics and the at least one detection apparatus define at least a first focus error detection path and a second focus error detection path, the first focus error detection path detects focus errors with a greater sensitivity than the second focus error detection path, while the second focus error detection path detects focus errors over a greater focus error range than the first focus error detection path.
Public/Granted literature
- US06750436B2 Focus error detection apparatus and method having dual focus error detection path Public/Granted day:2004-06-15
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