Invention Application
US20040017896A1 Apparatus and method for characterizing libraries of different materials using x-ray scattering
审中-公开
使用X射线散射来表征不同材料的文库的装置和方法
- Patent Title: Apparatus and method for characterizing libraries of different materials using x-ray scattering
- Patent Title (中): 使用X射线散射来表征不同材料的文库的装置和方法
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Application No.: US10448039Application Date: 2003-05-22
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Publication No.: US20040017896A1Publication Date: 2004-01-29
- Inventor: Damian Hajduk , James Bennett , Rakesh Jain
- Applicant: Symyx Technologies, Inc.
- Applicant Address: null
- Assignee: Symyx Technologies, Inc.
- Current Assignee: Symyx Technologies, Inc.
- Current Assignee Address: null
- Main IPC: H05G001/00
- IPC: H05G001/00

Abstract:
An apparatus for characterizing a library containing an array of samples. The apparatus includes an x-ray beam directed at the library, a chamber housing the library and a beamline for directing the x-ray beam onto the library in the chamber. The chamber may include a translation stage that holds the library and that is programmable to change the position of the library relative to the x-ray beam and a controller that controls the movement of the translation stage to expose an element to the x-ray beam in order to rapidly characterize the element in the library. During the characterization, the x-ray beam diffracts upon impinging the element and a detector detects the diffracted x-ray beam in order to generate characterization data for the element.
Information query