Invention Application
- Patent Title: Compact chemical reactor and chemical reaction system
- Patent Title (中): 紧凑化学反应器和化学反应系统
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Application No.: US10634380Application Date: 2003-08-04
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Publication No.: US20040025784A1Publication Date: 2004-02-12
- Inventor: Yoshihiro Kawamura , Naotsugu Ogura
- Applicant: Casio Computer Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Casio Computer Co., Ltd.
- Current Assignee: Casio Computer Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP2002-229390 20020807
- Main IPC: C30B001/00
- IPC: C30B001/00
Abstract:
The compact chemical reactor includes a first substrate, a second substrate attached to the first substrate. A micro flow path is defined between the first substrate and the second substrate. A thin film heater provided in the flow path.
Public/Granted literature
- US07175817B2 Compact chemical reactor and chemical reaction system Public/Granted day:2007-02-13
Information query
