Invention Application
US20040040003A1 Use of overlay diagnostics for enhanced automatic process control
有权
使用覆盖诊断功能进行增强的自动过程控制
- Patent Title: Use of overlay diagnostics for enhanced automatic process control
- Patent Title (中): 使用覆盖诊断功能进行增强的自动过程控制
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Application No.: US10438962Application Date: 2003-05-14
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Publication No.: US20040040003A1Publication Date: 2004-02-26
- Inventor: Joel L. Seligson , Mark Ghinovker , John Robinson , Pavel Izikson , Michael E. Adel , Boris Simkin , David Tulipman
- Applicant: KLA-Tencor Technologies, Corporation
- Applicant Address: null
- Assignee: KLA-Tencor Technologies, Corporation
- Current Assignee: KLA-Tencor Technologies, Corporation
- Current Assignee Address: null
- Main IPC: G06F017/50
- IPC: G06F017/50 ; H01L021/66

Abstract:
Disclosed are methods and apparatus for analyzing the quality of overlay targets. In one embodiment, a method of extracting data from an overlay target is disclosed. Initially, image information or one or more intensity signals of the overlay target are provided. An overlay error is obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. A systematic error metric is also obtained from the overlay target by analyzing the image information or the intensity signal(s) of the overlay target. For example, the systematic error may indicate an asymmetry metric for one or more portions of the overlay target. A noise metric is further obtained from the overlay target by applying a statistical model to the image information or the intensity signal(s) of the overlay target. Noise metric characterizes noise, such as a grainy background, associated with the overlay target. In other embodiments, an overlay and/or stepper analysis procedure is then performed based on the systematic error metric and/or the noise metric, as well as the overlay data.
Public/Granted literature
- US06928628B2 Use of overlay diagnostics for enhanced automatic process control Public/Granted day:2005-08-09
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