发明申请
- 专利标题： Apparatus and method for processing a substrate
- 专利标题（中）： 用于处理衬底的装置和方法
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申请号： US10658422申请日： 2003-09-10
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公开(公告)号： US20040045575A1公开(公告)日： 2004-03-11
- 发明人: Kazuto Kinoshita , Kazuhiko Gommori , Kenya Wada
- 申请人： Hitachi Electronics Engineering Co., Ltd
- 申请人地址： JP Shibuya-ku
- 专利权人： Hitachi Electronics Engineering Co., Ltd
- 当前专利权人： Hitachi Electronics Engineering Co., Ltd
- 当前专利权人地址： JP Shibuya-ku
- 优先权： JP11-221890 19990805; JP2000-165839 20000602
- 主分类号： B08B007/02
- IPC分类号： B08B007/02
摘要：
A lamp house is located face to face with a substrate which is transferred by a conveyer means. A dielectric barrier discharge lamp is provided in the lamp house to irradiate the substrate with ultraviolet light, while a moistened inert gas, consisting of an inert gas and water vapor, is supplied to a space between the substrate and the dielectric barrier discharge lamp from a moistened inert gas generating means. Under irradiation of ultraviolet light from the dielectric barrier discharge lamp, water vapor in the moistened inert gas is split into a reducing active member nullH.null and an oxidative active member null.OHnull.
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