发明申请
US20040057030A1 Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same
失效
用于保持薄的圆形掩模版和使用其的掩模版处理系统的掩模保持盒和方法
- 专利标题: Reticle-holding pods and methods for holding thin, circular reticles, and reticle-handling systems utilizing same
- 专利标题(中): 用于保持薄的圆形掩模版和使用其的掩模版处理系统的掩模保持盒和方法
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申请号: US10635803申请日: 2003-08-05
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公开(公告)号: US20040057030A1公开(公告)日: 2004-03-25
- 发明人: Yukiharu Okubo , Hidekazu Kikuchi
- 申请人: Nikon Corporation , Sendai Nikon Corporation
- 申请人地址: null null
- 专利权人: Nikon Corporation,Sendai Nikon Corporation
- 当前专利权人: Nikon Corporation,Sendai Nikon Corporation
- 当前专利权人地址: null null
- 优先权: JP2002-226926 20020805
- 主分类号: G03B027/42
- IPC分类号: G03B027/42
摘要:
Reticle-holding devices (reticle nullpodsnull) are disclosed for holding circular reticles as used microlithography systems that use circular reticles. An exemplary reticle pod includes a base and cover. Mounted to the base are multiple (desirably three) reticle-support blocks providing three respective, equally spaced, reticle-contact surfaces that support a reticle in the peripheral nullhandling zonenull of the reticle. Mounted to the inside surface of the cover are corresponding compliant pressure-application members (desirably respective flat springs terminating with respective reticle-contact members) that apply a holding force to the reticle. A respective portion of the reticle is situated between each pressure-application member and a respective reticle-support surface. Thus, the reticle, configured as a SEMI standard wafer, is stably held at three points in the handling zone of the reticle without damaging the reticle.