Invention Application
- Patent Title: Radiation source, lithographic apparatus and device manufacturing method
- Patent Title (中): 辐射源,光刻设备和器件制造方法
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Application No.: US10664065Application Date: 2003-09-17
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Publication No.: US20040105082A1Publication Date: 2004-06-03
- Inventor: Konstantin Nikolaevitch Koshelev , Vadim Yevgenyevich Banine , Vladimir Vital?apos;Evitch Ivanov , Erik Rene Kieft , Erik Roelof Loopstra , Lucas Henricus Johannes Stevens , Yurii Victorovitch Sidelkov , Vsevolod Grigorevitch Koloshnikov , Vladimir Mihailovitch Krivtsun , Robert Rafilevitch Gayazov , Olav Waldemar Vladimir Frijns
- Applicant: ASML Netherlands B. V.
- Applicant Address: NL Veldhoven
- Assignee: ASML Netherlands B. V.
- Current Assignee: ASML Netherlands B. V.
- Current Assignee Address: NL Veldhoven
- Priority: EP02256486.8 20020919; EP02256907.3 20021003
- Main IPC: G03B027/42
- IPC: G03B027/42

Abstract:
A radiation source comprises an anode and a cathode that are configured and arranged to create a discharge in a gas or vapor in a space between anode and cathode and to form a plasma pinch so as to generate electromagnetic radiation. The gas or vapor may comprise xenon, indium, lithium and/or tin. The radiation source may comprise a plurality of discharge elements, each of which is only used for short intervals, after which another discharge element is selected. The radiation source may also comprise a triggering device, which device can facilitate improving the exact timing of the pinch formation and thus the pulse of EUV radiation. The radiation source may also be constructed to have a low inductance, and operated in a self-triggering regime.
Public/Granted literature
- US07528395B2 Radiation source, lithographic apparatus and device manufacturing method Public/Granted day:2009-05-05
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