发明申请
- 专利标题: Exposure apparatus
- 专利标题(中): 曝光装置
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申请号: US10704688申请日: 2003-11-12
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公开(公告)号: US20040137384A1公开(公告)日: 2004-07-15
- 发明人: Hiromichi Hara
- 申请人: Canon Kabushiki Kaisha
- 申请人地址: JP Tokyo
- 专利权人: Canon Kabushiki Kaisha
- 当前专利权人: Canon Kabushiki Kaisha
- 当前专利权人地址: JP Tokyo
- 优先权: JP2003-005890 20030114
- 主分类号: G03C005/18
- IPC分类号: G03C005/18 ; G03C005/26
摘要:
An exposure apparatus for exposing a substrate in a vacuum atmosphere includes vibration absorbing mounts that are disposed in a vacuum chamber in order to make it possible to support at least one exposure structure in the vacuum atmosphere with high precision. The at least one exposure structure includes at least one of a mask stage plate, a wafer stage plate, and a barrel surface plate. The vibration absorbing mounts are formed using metallic bellows. By the vibration absorbing mounts, the at least one exposure structure is supported in the vacuum chamber.
公开/授权文献
- US06897939B2 Exposure apparatus 公开/授权日:2005-05-24