发明申请
- 专利标题： Pad constructions for chemical mechanical planarization applications
- 专利标题（中）： 用于化学机械平面化应用的垫结构
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申请号： US10744761申请日： 2003-12-23
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公开(公告)号： US20040137831A1公开(公告)日： 2004-07-15
- 发明人: Jeffrey S. Kollodge , Christopher N. Loesch
- 申请人： 3M Innovative Properties Company
- 申请人地址： null
- 专利权人： 3M Innovative Properties Company
- 当前专利权人： 3M Innovative Properties Company
- 当前专利权人地址： null
- 主分类号： B24B007/22
- IPC分类号： B24B007/22
摘要：
The present invention is directed to an abrasive article comprising a fixed abrasive layer and a subpad. The fixed abrasive element is co-extensive with the subpad. The subpad comprises a resilient element. The resilient element has a Shore A hardness of no greater than 60 as measured using ASTM-2240.
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