Invention Application
- Patent Title: Arrangement for the generation of intensive short-wave radiation based on a plasma
- Patent Title (中): 基于等离子体产生强烈的短波辐射的布置
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Application No.: US10777616Application Date: 2004-02-12
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Publication No.: US20040159802A1Publication Date: 2004-08-19
- Inventor: Christian Ziener , Kai Gaebel , Guido Hergenhan
- Priority: DE10306668.3 20030213
- Main IPC: G01J001/00
- IPC: G01J001/00

Abstract:
The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for generating radiation generated from plasma in which the individual pulse energy coupled into the plasma and, therefore, the usable radiation output are appreciably increased while retaining the advantages of mass-limited targets. According to the invention, this object is met in that the target generator has a multiple-channel nozzle with a plurality of separate orifices, wherein the orifices generate a plurality of target jets, the excitation radiation for generating plasma being directed simultaneously portion by portion to the target jets.
Public/Granted literature
- US06995382B2 Arrangement for the generation of intensive short-wave radiation based on a plasma Public/Granted day:2006-02-07
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