Invention Application
US20040159802A1 Arrangement for the generation of intensive short-wave radiation based on a plasma 失效
基于等离子体产生强烈的短波辐射的布置

  • Patent Title: Arrangement for the generation of intensive short-wave radiation based on a plasma
  • Patent Title (中): 基于等离子体产生强烈的短波辐射的布置
  • Application No.: US10777616
    Application Date: 2004-02-12
  • Publication No.: US20040159802A1
    Publication Date: 2004-08-19
  • Inventor: Christian ZienerKai GaebelGuido Hergenhan
  • Priority: DE10306668.3 20030213
  • Main IPC: G01J001/00
  • IPC: G01J001/00
Arrangement for the generation of intensive short-wave radiation based on a plasma
Abstract:
The invention is directed to an arrangement for generating intensive radiation based on a plasma, particularly short-wavelength radiation from soft x-ray radiation to extreme ultraviolet (EUV) radiation. The object of the invention is to find a novel possibility for generating radiation generated from plasma in which the individual pulse energy coupled into the plasma and, therefore, the usable radiation output are appreciably increased while retaining the advantages of mass-limited targets. According to the invention, this object is met in that the target generator has a multiple-channel nozzle with a plurality of separate orifices, wherein the orifices generate a plurality of target jets, the excitation radiation for generating plasma being directed simultaneously portion by portion to the target jets.
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