Invention Application
- Patent Title: Enhanced lithographic displacement measurement system
- Patent Title (中): 增强光刻位移测量系统
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Application No.: US10719067Application Date: 2003-11-24
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Publication No.: US20040169837A1Publication Date: 2004-09-02
- Inventor: Wouter Onno Pril , Engelbertus Antonius F. Van De Pasch , Robert F. Dillon , Philip Dennis Henshaw
- Applicant: ASML NETHERLANDS B.V.
- Applicant Address: NL Veldhoven
- Assignee: ASML NETHERLANDS B.V.
- Current Assignee: ASML NETHERLANDS B.V.
- Current Assignee Address: NL Veldhoven
- Main IPC: G03B027/52
- IPC: G03B027/52

Abstract:
Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.
Public/Granted literature
- US06987557B2 Enhanced lithographic displacement measurement system Public/Granted day:2006-01-17
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