发明申请
- 专利标题: Enhanced lithographic displacement measurement system
- 专利标题(中): 增强光刻位移测量系统
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申请号: US10719067申请日: 2003-11-24
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公开(公告)号: US20040169837A1公开(公告)日: 2004-09-02
- 发明人: Wouter Onno Pril , Engelbertus Antonius F. Van De Pasch , Robert F. Dillon , Philip Dennis Henshaw
- 申请人: ASML NETHERLANDS B.V.
- 申请人地址: NL Veldhoven
- 专利权人: ASML NETHERLANDS B.V.
- 当前专利权人: ASML NETHERLANDS B.V.
- 当前专利权人地址: NL Veldhoven
- 主分类号: G03B027/52
- IPC分类号: G03B027/52
摘要:
Measurements of an interferometric measurement system are corrected for variations of atmospheric conditions such as pressure, temperature, and turbulence using measurements from a second harmonic interferometer (SHI). A ramp, representing the dependence of the SHI data on path length, is removed before utilizing the SHI data. The SHI may include a passive Q-switched laser as a light source and Brewster prisms in the receiver module. Optical fibers may be used to conduct light to the detectors. A mirror reflecting the measurement beams has a coating of a thickness selected to minimize the sensitivity of the SHI data to changes in coating thickness.
公开/授权文献
- US06987557B2 Enhanced lithographic displacement measurement system 公开/授权日:2006-01-17
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