Invention Application
- Patent Title: Method of making floating gate non-volatile memory cell with low erasing voltage having double layer gate dielectric
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Application No.: US10792308Application Date: 2004-03-03
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Publication No.: US20040173840A1Publication Date: 2004-09-09
- Inventor: Paolo Cappelletti
- Applicant: SGS-THOMSON MICROELECTRONICS S.r.l.
- Applicant Address: null
- Assignee: SGS-THOMSON MICROELECTRONICS S.r.l.
- Current Assignee: SGS-THOMSON MICROELECTRONICS S.r.l.
- Current Assignee Address: null
- Priority: EP96830493.1 19960930
- Main IPC: H01L029/788
- IPC: H01L029/788

Abstract:
A non-volatile memory cell of the type which includes at least one floating gate transistor and which is realized over a semiconductor substrate includes a source region, and a drain region, separated by a channel region which is overlaid by a thin layer of gate oxide. The gate oxide isolates a floating gate region from the substrate. The floating gate region is coupled to a control gate terminal. The floating gate region of the memory cell develops a first potential barrier between the semiconductor substrate and the gate oxide layer, and a second different potential barrier between the floating gate region and the gate oxide.
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