发明申请
US20040198187A1 Polishing pad with a partial adhesive coating 审中-公开
抛光垫,部分粘合剂涂层

Polishing pad with a partial adhesive coating
摘要:
A method for selectively altering a polishing pad adhesive layer includes providing a mask having transparent regions and opaque regions and directing radiation toward the mask so that the radiation passes through the transparent regions and impinges onto the adhesive layer on the polishing pad. The area of the adhesive layer corresponding to the transparent regions of the mask is cured to be less adhesive. The area of the adhesive layer corresponding to the opaque regions remain adhesive.
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