发明申请
US20050012928A1 Apparatus and method for measuring overlay by diffraction gratings 有权
用衍射光栅测量覆盖层的装置和方法

Apparatus and method for measuring overlay by diffraction gratings
摘要:
A method for measuring overlay in a sample includes obtaining an image of an overlay target that includes a series of grating stacks each having an upper and lower grating, each grating stack having a unique offset between its upper and lower grating. The image is obtained with a set of illumination and collection optics where the numerical aperture of the collection optics is larger than the numerical aperture of the illumination optics and with the numerical apertures of the illumination and collection optics are selected so that the unit cells of gratings are not resolved, the grating stacks are resolved and they appear to have a uniform color within the image of the overlay target.
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