Invention Application
US20050026113A1 Micro-implantable apparatus and method for the stability assessment of a two-stage dental implant
审中-公开
用于两阶段牙科植入物的稳定性评估的微植入装置和方法
- Patent Title: Micro-implantable apparatus and method for the stability assessment of a two-stage dental implant
- Patent Title (中): 用于两阶段牙科植入物的稳定性评估的微植入装置和方法
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Application No.: US10629574Application Date: 2003-07-30
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Publication No.: US20050026113A1Publication Date: 2005-02-03
- Inventor: Jiunn-Liang Chen , Sheng-Yang Lee , Hao-Ming Huang , Kuang-Yu Cheng
- Applicant: Jiunn-Liang Chen , Sheng-Yang Lee , Hao-Ming Huang , Kuang-Yu Cheng
- Main IPC: A61B5/07
- IPC: A61B5/07 ; A61C8/00

Abstract:
A micro-implantable apparatus and method for the stability assessment of a two-stage dental implant during Osseo integration processes, whose detection device is based on a transmission of a pulse wave signal from an upper opening of an implant and a subsequent analysis of the reflection waves that measure the changes in mechanical interlock between the bone and the implant resulted from the wound healing processes happened at the gap between bone-implant interface. The incorporation of RF coils in the detection device provides a mean to transmit and to receive the detection waves, which makes it possible for such a device to be operated in a wireless setting. This device also includes an energy storage, which serve as a temporary power supply unit to effectively eliminate the need for signal wires and power cores, which in turn further increases the applicability and safety of such a device as a passive, implant able apparatus.
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