发明申请
US20050029244A1 Ceramic substrate, ceramic heater, electrostatic chuck and wafer prober for use in semiconductor producing and inspecting devices
审中-公开
陶瓷基板，陶瓷加热器，静电卡盘和晶圆探针，用于半导体生产和检测装置
- 专利标题： Ceramic substrate, ceramic heater, electrostatic chuck and wafer prober for use in semiconductor producing and inspecting devices
- 专利标题（中）： 陶瓷基板，陶瓷加热器，静电卡盘和晶圆探针，用于半导体生产和检测装置
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申请号： US10943974申请日： 2004-09-20
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公开(公告)号： US20050029244A1公开(公告)日： 2005-02-10
- 发明人: Yasutaka Ito , Yasuji Hiramatsu
- 申请人： Yasutaka Ito , Yasuji Hiramatsu
- 申请人地址： JP Ogaki-shi 503-8004
- 专利权人： IBIDEN CO., LTD.
- 当前专利权人： IBIDEN CO., LTD.
- 当前专利权人地址： JP Ogaki-shi 503-8004
- 优先权： JP11/228908 19990812; JP11/377207 19991229
- 主分类号： C04B35/00
- IPC分类号： C04B35/00 ; C04B35/581 ; H01L21/027 ; H01L21/66 ; H01L21/68 ; H01L21/683 ; H05B3/02 ; H05B3/14 ; H05B3/20 ; H05B3/18 ; H05B3/68
摘要：
A ceramic substrate for semiconductor manufacture and/or inspection which is conducive to decrease in α-rays radiated, to prevent electrical errors, and to decrease an electrostatic chucking force such as heater or wafer prober, generation of particles, and circuit defects. The ceramic substrate is configured such that the level of α-rays radiated from the surface of the ceramic substrate is not higher than 0.250 c/cm2·hr.
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