Invention Application
US20050030003A1 Method and apparatus for electron density measurement and verifying process status
失效
用于电子密度测量和验证过程状态的方法和装置
- Patent Title: Method and apparatus for electron density measurement and verifying process status
- Patent Title (中): 用于电子密度测量和验证过程状态的方法和装置
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Application No.: US10495864Application Date: 2003-01-30
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Publication No.: US20050030003A1Publication Date: 2005-02-10
- Inventor: Eric Strang
- Applicant: Eric Strang
- International Application: PCT/US03/01070 WO 20030130
- Main IPC: G01R17/10
- IPC: G01R17/10 ; G05B20060101 ; G06F17/00 ; H01J37/32 ; H01L21/66

Abstract:
An equipment status monitoring system and method of operating thereof is described. The equipment status monitoring system includes at least one microwave mirror in a plasma processing chamber forming a multi-modal resonator. A power source is coupled to a mirror and configured to produce an excitation signal extending along an axis generally perpendicular to a substrate. A detector is coupled to a mirror and configured to measure an excitation signal. A control system is connected to the detector that compares a measured excitation signal to a normal excitation signal in order to determine a status of the material processing equipment.
Public/Granted literature
- US07263447B2 Method and apparatus for electron density measurement and verifying process status Public/Granted day:2007-08-28
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