Invention Application
US20050030003A1 Method and apparatus for electron density measurement and verifying process status 失效
用于电子密度测量和验证过程状态的方法和装置

  • Patent Title: Method and apparatus for electron density measurement and verifying process status
  • Patent Title (中): 用于电子密度测量和验证过程状态的方法和装置
  • Application No.: US10495864
    Application Date: 2003-01-30
  • Publication No.: US20050030003A1
    Publication Date: 2005-02-10
  • Inventor: Eric Strang
  • Applicant: Eric Strang
  • International Application: PCT/US03/01070 WO 20030130
  • Main IPC: G01R17/10
  • IPC: G01R17/10 G05B20060101 G06F17/00 H01J37/32 H01L21/66
Method and apparatus for electron density measurement and verifying process status
Abstract:
An equipment status monitoring system and method of operating thereof is described. The equipment status monitoring system includes at least one microwave mirror in a plasma processing chamber forming a multi-modal resonator. A power source is coupled to a mirror and configured to produce an excitation signal extending along an axis generally perpendicular to a substrate. A detector is coupled to a mirror and configured to measure an excitation signal. A control system is connected to the detector that compares a measured excitation signal to a normal excitation signal in order to determine a status of the material processing equipment.
Information query
Patent Agency Ranking
0/0