发明申请
- 专利标题: Thin film magnetic head and manufacturing method thereof
- 专利标题(中): 薄膜磁头及其制造方法
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申请号: US10894723申请日: 2004-07-19
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公开(公告)号: US20050036236A1公开(公告)日: 2005-02-17
- 发明人: Gen Oikawa , Kazue Kudo , Youji Maruyama , Noriyuki Saiki , Hiromi Shiina
- 申请人: Gen Oikawa , Kazue Kudo , Youji Maruyama , Noriyuki Saiki , Hiromi Shiina
- 申请人地址: JP Odawara-shi
- 专利权人: Hitachi Global Storage Technologies, Japan, Ltd.
- 当前专利权人: Hitachi Global Storage Technologies, Japan, Ltd.
- 当前专利权人地址: JP Odawara-shi
- 优先权: JP2003-207420 20030813
- 主分类号: G11B5/147
- IPC分类号: G11B5/147 ; G11B5/31
摘要:
Embodiments of the invention provide a lustrous and uniform plating film having high-performance magnetic characteristics and a thin film magnetic head usable in a high frequency recording band by using the plating film of the invention at a magnetic pole portion. Plating is performed in a plating bath at a low pH of about 1.5 to 2.3. The accuracy of pH control is improved. A magnetic film with the addition of a high resistive metal such as Cr or Mo is formed under the plating condition. Further, the magnetic characteristic is improved by applying a heat treatment to the plating film in a magnetic field, according to specific embodiments of the present invention. A plating film with brightness and uniformity having high saturation magnetic flux density can be formed by reducing the hysteresis loss and the eddy current loss as the magnetic characteristics by the above techniques.
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