发明申请
- 专利标题: Method of manufacturing thin-film magnetic head
- 专利标题(中): 制造薄膜磁头的方法
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申请号: US10654421申请日: 2003-09-04
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公开(公告)号: US20050050715A1公开(公告)日: 2005-03-10
- 发明人: Yoshitaka Sasaki , Hiroyuki Itoh , Shigeki Tanemura , Kazuo Ishizaki , Takehiro Kamigama
- 申请人: Yoshitaka Sasaki , Hiroyuki Itoh , Shigeki Tanemura , Kazuo Ishizaki , Takehiro Kamigama
- 申请人地址: US CA Milpitas CN Hong Kong
- 专利权人: HEADWAY TECHNOLOGIES, INC.,SAE MAGNETICS (H.K.) Ltd.
- 当前专利权人: HEADWAY TECHNOLOGIES, INC.,SAE MAGNETICS (H.K.) Ltd.
- 当前专利权人地址: US CA Milpitas CN Hong Kong
- 主分类号: G11B5/127
- IPC分类号: G11B5/127 ; G11B5/31 ; H04R31/00
摘要:
A thin-film magnetic head comprises a top pole layer incorporating a throat height defining layer and a yoke portion layer. The throat height defining layer is formed as follows. A magnetic layer to be a track width defining portion is formed on a recording gap layer. Next, the magnetic layer is selectively etched through the use of a mask so as to form an end portion of the magnetic layer for defining the throat height. Next, a nonmagnetic layer is formed to fill the etched portion of the magnetic layer while the mask is left unremoved. Next, the yoke portion layer is formed. Using the track width defining portion as a mask, the magnetic layer, the recording gap layer and a portion of the bottom pole layer are etched.
公开/授权文献
- US07082672B2 Method of manufacturing thin-film magnetic head 公开/授权日:2006-08-01
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