发明申请
- 专利标题: Apparatus and method for inspecting pattern
- 专利标题(中): 用于检查图案的装置和方法
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申请号: US10979169申请日: 2004-11-03
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公开(公告)号: US20050062961A1公开(公告)日: 2005-03-24
- 发明人: Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
- 申请人: Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
- 优先权: JP2001-228166 20010727
- 主分类号: G01N21/33
- IPC分类号: G01N21/33 ; G01N21/95 ; G01N21/956 ; H01L21/66 ; G01N21/88
摘要:
An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.
公开/授权文献
- US07081953B2 Apparatus and method for inspecting pattern 公开/授权日:2006-07-25
信息查询
IPC分类: