发明申请
- 专利标题: Frequency division multiplexing (FDM) lithography
- 专利标题(中): 频分复用(FDM)光刻技术
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申请号: US10949678申请日: 2004-09-24
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公开(公告)号: US20050064347A1公开(公告)日: 2005-03-24
- 发明人: Yao-Ting Wang
- 申请人: Yao-Ting Wang
- 主分类号: G03F7/20
- IPC分类号: G03F7/20
摘要:
Systems and methods for generating an image are provided. These systems and methods include generating multiple light beams from a light source by controlling at least one parameter of the light source to be different among each of the multiple light beams. The systems and methods further include forming multiple light patterns of circuit structures that are separated in frequency by directing each of the light beams at a mask of circuit features. The systems and methods, when used in lithography for example, further include directing each of the light patterns toward a silicon substrate. The silicon substrate includes a silicon wafer having a surface at least partially covered with at least one of a photoresist material and a reversible contrast enhancement material (R-CEM).
公开/授权文献
- US07879538B2 Frequency division multiplexing (FDM) lithography 公开/授权日:2011-02-01