发明申请
- 专利标题: Lithographic apparatus and device manufacturing method
- 专利标题(中): 平版印刷设备和器件制造方法
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申请号: US10946333申请日: 2004-09-22
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公开(公告)号: US20050068510A1公开(公告)日: 2005-03-31
- 发明人: Arno Bleeker , Dominicus Adrianus Franken , Peter Kochersperger , Kars Troost
- 申请人: Arno Bleeker , Dominicus Adrianus Franken , Peter Kochersperger , Kars Troost
- 专利权人: ASML Netherlands B.V.
- 当前专利权人: ASML Netherlands B.V.
- 优先权: EP03255906.4 20030922
- 主分类号: G02B26/08
- IPC分类号: G02B26/08 ; G02B5/10 ; G03F7/20 ; H01L21/027 ; G03B27/54
摘要:
One or more patterning arrays are mounted to a mounting plate via height adjustment structures that enable the flatness of the active surfaces of the patterning arrays to be controlled. The height adjustment structures may comprise an array of piezoelectric actuators or screws. Alternatively, the backside of the patterning means may be polished to optical flatness and bonded by crystal bonding to an optically flat surface of a rigid mounting body.
公开/授权文献
- US07411652B2 Lithographic apparatus and device manufacturing method 公开/授权日:2008-08-12
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