发明申请
- 专利标题: Interconnection substrate and fabrication method thereof
- 专利标题(中): 互连基板及其制造方法
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申请号: US10947177申请日: 2004-09-23
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公开(公告)号: US20050079707A1公开(公告)日: 2005-04-14
- 发明人: Norihito Tsukahara , Kazuhiro Nishikawa , Daisuke Sakurai
- 申请人: Norihito Tsukahara , Kazuhiro Nishikawa , Daisuke Sakurai
- 优先权: JP2003-335268 20030926
- 主分类号: H05K1/09
- IPC分类号: H05K1/09 ; H01B5/14 ; H05K3/12 ; H05K3/24 ; H01L21/00 ; H01L21/4763 ; H01L21/84
摘要:
An interconnection substrate include: interconnection layer 12 region where at least first conductor layer 16 and second conductor layer 18 are vertically stacked in that order on substrate 10, first conductor layer 16 and second conductor layer 18 containing conductive particles and a binder, wherein first conductor layer 16 and second conductor layer 18 stacked in the interconnection layer 12 region have conductive particles different in average particle size from each other. As a result, only intended region can have low resistance.
公开/授权文献
- US07233069B2 Interconnection substrate and fabrication method thereof 公开/授权日:2007-06-19
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