Invention Application
US20050084805A1 Method for forming patterned ITO structure by using photosensitive ITO solution
审中-公开
通过使用感光ITO溶液形成图案化ITO结构的方法
- Patent Title: Method for forming patterned ITO structure by using photosensitive ITO solution
- Patent Title (中): 通过使用感光ITO溶液形成图案化ITO结构的方法
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Application No.: US10687612Application Date: 2003-10-20
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Publication No.: US20050084805A1Publication Date: 2005-04-21
- Inventor: Lu-Yi Yang , Ching-Chung Cheng , Yen-Ting Shen , Yuan-Chi Lin
- Applicant: Lu-Yi Yang , Ching-Chung Cheng , Yen-Ting Shen , Yuan-Chi Lin
- Main IPC: G03C5/00
- IPC: G03C5/00 ; G03F7/004 ; G03F7/20 ; H01L21/00 ; H01L31/18
Abstract:
A method for forming a patterned ITO structure by using a photosensitive ITO solution is provided. By mixing both the ITO and photosensitive material to form a photosensitive ITO solution on a substrate, a patterned ITO structure is available by directly exposing and developing the photosensitive ITO layer. Significantly, no photo-resist layer is required.
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