发明申请
- 专利标题： Precursor delivery system with rate control
- 专利标题（中）： 带速率控制的前置发送系统
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申请号： US10700328申请日： 2003-11-03
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公开(公告)号： US20050095859A1公开(公告)日： 2005-05-05
- 发明人: Ling Chen , Phillip Kang , Seshadri Ganguli
- 申请人： Ling Chen , Phillip Kang , Seshadri Ganguli
- 专利权人： APPLIED MATERIALS, INC.
- 当前专利权人： APPLIED MATERIALS, INC.
- 主分类号： C23C16/448
- IPC分类号： C23C16/448 ; C23C16/52 ; H01L21/285 ; H01L21/302 ; H01L21/461
摘要：
A method and apparatus for a gas delivery system to deliver a precursor from a vessel to a process chamber via a process gas produced by flowing a first carrier gas into the vessel and combining with a second carrier gas flowing through a bypass around the vessel and a precursor monitoring apparatus disposed between the process chamber and the vessel. The precursor monitoring apparatus has a gas analyzer to generate a first signal indicative of a concentration of the precursor in the process gas or to a signal indicative of a flow rate of the process gas.
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