发明申请
US20050101038A1 Method and apparatus for a heterojunction bipolar transistor using self-aligned epitaxy
有权
使用自对准外延的异质结双极晶体管的方法和装置
- 专利标题: Method and apparatus for a heterojunction bipolar transistor using self-aligned epitaxy
- 专利标题(中): 使用自对准外延的异质结双极晶体管的方法和装置
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申请号: US10703297申请日: 2003-11-06
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公开(公告)号: US20050101038A1公开(公告)日: 2005-05-12
- 发明人: Purakh Verma , Shao-Fu Chu , Lap Chan , Jian Li , Jia Zheng
- 申请人: Purakh Verma , Shao-Fu Chu , Lap Chan , Jian Li , Jia Zheng
- 申请人地址: SG Singapore
- 专利权人: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
- 当前专利权人: CHARTERED SEMICONDUCTOR MANUFACTURING LTD.
- 当前专利权人地址: SG Singapore
- 主分类号: H01L21/331
- IPC分类号: H01L21/331 ; H01L29/737 ; H01L21/00
摘要:
A heterojunction bipolar transistor (HBT), and manufacturing method therefor, comprising a semiconductor substrate having a collector region, a number of insulating layers over the semiconductor substrate, at least one of the number of insulating layers having a base cavity over the collector region, a base structure of a compound semiconductive material in the base cavity, a window in the insulating layer over the base cavity, an emitter structure in the window, an interlevel dielectric layer, and connections through the interlevel dielectric layer to the base structure, the emitter structure, and the collector region. The base structure and the emitter structure preferably are formed in the same processing chamber.
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