发明申请
- 专利标题： Discharge light source with electron beam excitation
- 专利标题（中）： 放电光源与电子束激发
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申请号： US10506273申请日： 2003-02-26
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公开(公告)号： US20050117621A1公开(公告)日： 2005-06-02
- 发明人: Albrecht Kraus
- 申请人： Albrecht Kraus
- 申请人地址： NL BA Eindhoven
- 专利权人： Koninlijke Philips Electronics N.V.
- 当前专利权人： Koninlijke Philips Electronics N.V.
- 当前专利权人地址： NL BA Eindhoven
- 优先权： DE10209642.2 20020305
- 国际申请： PCT/IB03/00717 WO 20030226
- 主分类号： H01J61/16
- IPC分类号： H01J61/16 ; H01J63/08 ; H01S3/09
摘要：
The invention relates to a light source (1) with a discharge vessel (12) which is filled with a filling gas, and with an electron beam source (2) which is arranged in vacuum or in a region of low pressure and which generates electrons, propelling the latter through an entry foil (10) into the discharge vessel (12). According to the invention, an electric field can be generated inside the discharge vessel (12).
公开/授权文献
- US07397193B2 Discharge light source with electron beam excitation 公开/授权日：2008-07-08
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