Invention Application
- Patent Title: System and method for the online design of a reticle field layout
- Patent Title (中): 网路设计的系统和方法
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Application No.: US10880903Application Date: 2004-06-30
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Publication No.: US20050125763A1Publication Date: 2005-06-09
- Inventor: Ko-Feng Lin , Yi-Hsu Chen , Lee-Chih Yeh , Chun-Jen Chen , Ta-Chin Chin
- Applicant: Ko-Feng Lin , Yi-Hsu Chen , Lee-Chih Yeh , Chun-Jen Chen , Ta-Chin Chin
- Applicant Address: TW Hsin-Chu
- Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee: Taiwan Semiconductor Manufacturing Company, Ltd.
- Current Assignee Address: TW Hsin-Chu
- Main IPC: G06F13/10
- IPC: G06F13/10 ; G06F17/50 ; G03F9/00 ; G21K5/00
Abstract:
Provided are a system and method for creating a reticle field layout (RFL). In one example, the method includes receiving information for a RFL design by a computer system directly from a user via a computer interface. The RFL design is automatically verified using predefined specification and design rules accessible to the computer system. The RFL design may be modified by adding additional features before being finalized.
Information query
