发明申请
US20050130048A1 Electro-optic device substrate and method for manufacturing the same electro-optic device and method for manufacturing the same, photomask, and electronic device 审中-公开
电光器件基板和制造相同的电光器件的方法及其制造方法,光掩模和电子器件

Electro-optic device substrate and method for manufacturing the same electro-optic device and method for manufacturing the same, photomask, and electronic device
摘要:
A photomask is used for an exposure process for roughening the surface of a process region of a film. The photomask includes a first region and a second region. The first region serves as a transmissive portion that transmits light traveling toward the periphery of the process region. The second region includes a plurality of dot regions each having a light-shielding portion for shielding the light traveling toward the process region and a semitransmissive portion that transmits the light traveling toward the process region in a region other than the dot regions, the semitransmissive portion transmitting the light at a lower transmittance than that of the transmissive portion.
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