发明申请
- 专利标题: Electro-optic device substrate and method for manufacturing the same electro-optic device and method for manufacturing the same, photomask, and electronic device
- 专利标题(中): 电光器件基板和制造相同的电光器件的方法及其制造方法,光掩模和电子器件
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申请号: US10983333申请日: 2004-11-05
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公开(公告)号: US20050130048A1公开(公告)日: 2005-06-16
- 发明人: Tomoyuki Nakano , Hideki Kaneko , Toshihiro Otake , Keiji Takizawa
- 申请人: Tomoyuki Nakano , Hideki Kaneko , Toshihiro Otake , Keiji Takizawa
- 优先权: JP2003-380000 20031110; JP2003-380001 20031110
- 主分类号: G02F1/13
- IPC分类号: G02F1/13 ; G02F1/1335 ; G03F1/00 ; G03F7/00 ; G03F9/00 ; G03C5/00 ; G21K5/00
摘要:
A photomask is used for an exposure process for roughening the surface of a process region of a film. The photomask includes a first region and a second region. The first region serves as a transmissive portion that transmits light traveling toward the periphery of the process region. The second region includes a plurality of dot regions each having a light-shielding portion for shielding the light traveling toward the process region and a semitransmissive portion that transmits the light traveling toward the process region in a region other than the dot regions, the semitransmissive portion transmitting the light at a lower transmittance than that of the transmissive portion.
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